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Items for Subject "atomic layer deposition"

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Issue DateTitleAuthor(s)
Aug-2006 ALD and Characterization of Aluminum Oxide Deposited on Si(100) Using Tris(diethylamino) Aluminum and Water Vapor Katamreddy, Rajesh; Inman, Ronald; Jursich, Gregory; Soulet, Axel; Takoudis, Christos
Jun-2007 Cyclic Chemical-Vapor-Deposited TiO2/Al2O3 Film Using Trimethyl Aluminum, Tetrakis(diethylamino)titanium, and O2 Song, Xuemei; Takoudis, Christos G

 

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