Browse Chemical Engineering, Department of by Author "Takoudis, Christos"

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ALD and Characterization of Aluminum Oxide Deposited on Si(100) Using Tris(diethylamino) Aluminum and Water Vapor

Katamreddy, Rajesh; Inman, Ronald; Jursich, Gregory; Soulet, Axel; Takoudis, Christos (Electrochemical Society, 2006-08)

PDF (40KB)
Flexible high capacitance nanocomposite gate insulator for printed organic field-effect transistors

Rasul, Amjad; Zhang, Jie; Gamota, Dan; Singh, Manish; Takoudis, Christos (Elsevier, 2010-09-30)

PDF (106KB)
Selective atomic layer deposition of HfO2 on copper patterned silicon substrates

Tao, Qian; Jursich, Gregory; Takoudis, Christos (American Institute of Physics, 2010)

PDF (272KB)

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