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ALD and Characterization of Aluminum Oxide Deposited on Si(100) Using Tris(diethylamino) Aluminum and Water Vapor

Katamreddy, Rajesh; Inman, Ronald; Jursich, Gregory; Soulet, Axel; Takoudis, Christos (Electrochemical Society, 2006-08)

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Cyclic Chemical-Vapor-Deposited TiO2/Al2O3 Film Using Trimethyl Aluminum, Tetrakis(diethylamino)titanium, and O2

Song, Xuemei; Takoudis, Christos G (Electrochemical Society, 2007-06)

PDF (505KB)
Selective atomic layer deposition of HfO2 on copper patterned silicon substrates

Tao, Qian; Jursich, Gregory; Takoudis, Christos (American Institute of Physics, 2010)

PDF (272KB)

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