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Atomic layer deposition and characterization of stoichiometric erbium oxide thin dielectrics on Si(1 0 0) using (CpMe)3Er precursor and ozone

Xu, Runshen; Tao, Qian; Yang, Yi; Takoudis, Christos G. (Elsevier, 2012-09-01)

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Selective atomic layer deposition of HfO2 on copper patterned silicon substrates

Tao, Qian; Jursich, Gregory; Takoudis, Christos (American Institute of Physics, 2010)

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